Ph.D

Institute of Nuclear Science & Technology, Sichuan University

Chengdu 610064

P.R.China

Email: linliwei@scu.edu.cn

Education:

2006--2009, Nagoya Institute of Technology (Japan), Ph.D

2002--2005, University of Electronic Science and Technology of China, M.S

1998--2002, Yantai Normal University, B.S

Interests

Material modification and irradiation effect

Functional thin film

Energy material

代表性论文和成果Selected Publications and Achievements：

1. L.W. Lin, B. Liu*, D. Ren*, C.Y. Zhan, G.H. Jiao, K.W. Xu，Effect of sputtering bias voltage on the structure and properties of Zr–Ge–N diffusion barrier films， Surface & Coatings Technology, 228 (2013) S237–S240. 

2. D. Ren, J.F. Du, T. Xiao, B. Yang, B. Liu*, L.W. Lin*, Effect of initial-annealing on the microstructure of C–SiC/Cu composite coatings, Nuclear Instruments and Methods in Physics Research B, 307(2013), 16-19.  

3. B Liu, L W Lin*, D Ren*, Y P Zhang, G H Jiao and K W Xu, Cu(Ge) alloy films with zirconium addition on barrierless Si for excellent property improvement, J. Phys. D: Appl. Phys. 46 (2013) 155305. 

4. 植超虎、刘波、任丁、杨斌、林黎蔚†，调幅W (Mo)/Cu 纳米多层膜He+ 离子辐照响应行为，物理学报Acta Phys. Sin. Vol. 62, No. 15 (2013) 156801.

5. Shunli Chen, Bo Liu*, Liwei Lin*, Guohua Jiao, Microstructural development and helium bubble formation in Cu/W(Re) nanometer multilayer films irradiated by He⁺ ion, Nuclear Instruments and Methods in Physics Research B, 354(2015),244-248. 

6. Hailin Zhu, Jijun Yang*, Qiang Wan, Liwei Lin*, Jiali Liao,Yuanyou Yang and Ning Liu, Fabrication of homogenous multilayered W films by multi-step sputtering deposition: a novel grain boundary enrichment strategy, Nanotechnology 26 (2015) 445603.